Standard Products

      TMC is specialized in the research, development, manufacturing and sales of photomasks. We produce the mold for the manufacturing of IC and it is a build-to-order product. Conforming to the fast growth and continual evolution in semiconductor industry, we keep fully supplying all the needs of photomasks and contribute compression cycle time for new developed products, which always satisfy to our customers.
     With ongoing development and improvement of IC chip manufacturing in foundries, TMC supply photomasks and reticles for the following products.
● 1X Photomask (PE / MPA)
Reticle Material Quartz
Reticle Dimension
4"x4"x0.09"
5"x5"x0.09"
6"x6"x0.12"
7"x7"x0.12"
7"x7"x0.15"
CD Tolerance ±0.1 um
Registration ±0.2 um
Defect <= 1dpsi @ 1um
● 1X Photomask (PLA)
Reticle Material SODA LINE
Reticle Dimension
4"x4"x0.06"
4"x4"x0.09"
5"x5"x0.09"
6"x6"x0.12"
7"x7"x0.12"
9"x9"x0.12"
CD Tolerance ±0.3 um
Registration ±2 um
Defect <=2dpsi @ 2um
● UT 1X Reticle
Reticle Material Quartz
Reticle Dimension
3"x5"x0.09"
5"x5"x0.09"
6"x6"x0.25"
CD Tolerance ±0.05 um
Registration ±0.1 um
Defect 0.5 um
● 5X , 4X , 2.5X , 2X , Reticle for stepper
Reticle Material Quartz
Reticle Dimension
5"x5"x 0.09"
5"x5"x 0.18"
6"x6"x 0.12"
6"x6"x 0.25"
Stepper Type ASML,NIKON,CANON
CD Tolerance Mean to target >=0.015 um
Uniformity (3δ) >=0.020 um
Registration >=0.03 um
Defect 0.15 um
● Large Area Mask (LAM)
Reticle Material SODA LINE (UNIT:mm)
Reticle Dimension 8" ~ 24"
Min Line/Space 6 um
Line Tolerance ±1.0 um
Defect 3 um